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http://dx.doi.org/10.1201/9781420043778
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Front MatterAbstract - Hi-Res PDF (170 KB) - PDF w/links (170 KB)
Chapter 1. Defects in Ultra-Shallow JunctionsMark E. Law, Renata Camillo-Castillo, Lance Robertson, Kevin S. JonesAbstract - Hi-Res PDF (1786 KB) - PDF w/links (866 KB)
Chapter 2. Hydrogen-Related Defects in Silicon, Germanium, and Silicon–Germanium AlloysA. R. Peaker, V. P. Markevich, L. DobaczewskiAbstract - Hi-Res PDF (660 KB) - PDF w/links (741 KB)
Chapter 3. Defects in Strained-Si MOSFETsYongke Sun, Scott E. ThompsonAbstract - Hi-Res PDF (1385 KB) - PDF w/links (680 KB)
Chapter 4. The Effect of Defects on Electron Transport in Nanometer-Scale Electronic DevicesM. V. Fischetti, S. JinAbstract - Hi-Res PDF (847 KB) - PDF w/links (886 KB)
Chapter 5. Electrical Characterization of Defects in Gate DielectricsDieter K. SchroderAbstract - Hi-Res PDF (1510 KB) - PDF w/links (1563 KB)
Chapter 6. Dominating Defects in the MOS SystemPatrick M. LenahanAbstract - Hi-Res PDF (1442 KB) - PDF w/links (1504 KB)
Chapter 7. Oxide Traps, Border Traps, and Interface Traps in SiO2Abstract - Hi-Res PDF (1557 KB) - PDF w/links (1675 KB)
Chapter 8. From 3D Imaging of Atoms to Macroscopic Device PropertiesM. F. Chisholm, K. van Benthem, A. G. MarinopoulosAbstract - Hi-Res PDF (2440 KB) - PDF w/links (1338 KB)
Chapter 9. Defect Energy Levels in HfO2 and Related High-K Gate OxidesJ. Robertson, K. Xiong, K. TseAbstract - Hi-Res PDF (1356 KB) - PDF w/links (585 KB)
Chapter 10. Spectroscopic Studies of Electrically Active Defects in High-K Gate DielectricsGerald LucovskyAbstract - Hi-Res PDF (2322 KB) - PDF w/links (2350 KB)
Chapter 11. Defects in CMOS Gate DielectricsEric Garfunkel, Jacob Gavartin, Gennadi BersukerAbstract - Hi-Res PDF (1212 KB) - PDF w/links (1247 KB)
Chapter 12. Negative Bias Temperature Instabilities in High-k Gate DielectricsM. Houssa, M. Aoulaiche, S. De Gendt, G. Groeseneken, M. M. HeynsAbstract - Hi-Res PDF (777 KB) - PDF w/links (795 KB)
Chapter 13. Defect Formation and Annihilation in Electronic Devices and the Role of HydrogenLeonidas TsetserisAbstract - Hi-Res PDF (1031 KB) - PDF w/links (571 KB)
Chapter 14. Toward Engineering Modeling of Negative Bias Temperature InstabilityTibor Grasser, Wolfgang Goes, Ben KaczerAbstract - Hi-Res PDF (1099 KB) - PDF w/links (1128 KB)
Chapter 15. Wear-Out and Time-Dependent Dielectric Breakdown in Silicon OxidesJohn S. SuehleAbstract - Hi-Res PDF (786 KB) - PDF w/links (818 KB)
Chapter 16. Defects Associated with Dielectric Breakdown in SiO2-Based Gate DielectricsJordi Suñé, Ernest Y. WuAbstract - Hi-Res PDF (1217 KB) - PDF w/links (900 KB)
Chapter 17. Defects in Thin and Ultrathin Silicon DioxidesGiorgio Cellere, Simone Gerardin, Alessandro PaccagnellaAbstract - Hi-Res PDF (1251 KB) - PDF w/links (964 KB)
Chapter 18. Structural Defects in SiO2–Si Caused by Ion BombardmentAntoine D. Touboul, Aminata Carvalho, Mathias Marinoni, Frederic Saigne, Jacques Bonnet, Jean GasiotAbstract - Hi-Res PDF (1142 KB) - PDF w/links (731 KB)
Chapter 19. Impact of Radiation-Induced Defects on Bipolar Device OperationRonald L. Pease, Leonidas TsetserisAbstract - Hi-Res PDF (758 KB) - PDF w/links (797 KB)
Chapter 20. Silicon Dioxide–Silicon Carbide InterfacesS. Dhar, J. R. Williams, L. C. FeldmanAbstract - Hi-Res PDF (2076 KB) - PDF w/links (1394 KB)
Chapter 21. Defects in SiCE. Janzén, A. Gali, A. Henry, I. G. Ivanov, B. Magnusson, N. T. SonAbstract - Hi-Res PDF (2200 KB) - PDF w/links (2317 KB)
Chapter 22. Defects in Gallium ArsenideH. J. von Bardeleben, J. C. BourgoinAbstract - Hi-Res PDF (327 KB) - PDF w/links (365 KB)
AppendixA. Selected High-Impact Journal Articles on Defects in Microelectronic Materials and DevicesAbstract - Hi-Res PDF (566 KB) - PDF w/links (811 KB)
