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http://dx.doi.org/10.1201/9781420028782
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Front MatterAbstract - Hi-Res PDF (400 KB) - PDF w/links (399 KB)
Chapter 1. Introduction to Mask MakingAndrew G. ZanzalAbstract - Hi-Res PDF (536 KB) - PDF w/links (532 KB)
Chapter 2. Data PreparationPaul J.M. van Adrichem, Christian K. KalusAbstract - Hi-Res PDF (1361 KB) - PDF w/links (1058 KB)
Chapter 3. Mask WritersSergey A. BabinAbstract - Hi-Res PDF (849 KB) - PDF w/links (853 KB)
Chapter 4. E-Beam Mask WritersAbstract - Hi-Res PDF (1253 KB) - PDF w/links (1233 KB)
Chapter 5. Laser Mask WritersChrister RydbergAbstract - Hi-Res PDF (1490 KB) - PDF w/links (1570 KB)
Chapter 6. Advanced Optical MasksNobuyuki YoshiokaAbstract - Hi-Res PDF (887 KB) - PDF w/links (870 KB)
Chapter 7. Conventional Optical MasksSyed A. RizviAbstract - Hi-Res PDF (277 KB) - PDF w/links (278 KB)
Chapter 8. Advanced Optical MasksFrank Schellenberg, Wilhelm MaurerAbstract - Hi-Res PDF (1088 KB) - PDF w/links (1085 KB)
Chapter 9. NGL MasksMichael Lercel, Kurt R. KimmelAbstract - Hi-Res PDF (181 KB) - PDF w/links (182 KB)
Chapter 10. Masks for Electron Beam Projection LithographyMasaki Yamabe, Hisatak Sano, Shane PalmerAbstract - Hi-Res PDF (1175 KB) - PDF w/links (1150 KB)
Chapter 11. Masks for Extreme Ultraviolet LithographyPei-yang YanAbstract - Hi-Res PDF (1161 KB) - PDF w/links (1130 KB)
Chapter 12. Masks for Extreme Ultraviolet LithographySyed A. RizviAbstract - Hi-Res PDF (1214 KB) - PDF w/links (1130 KB)
Chapter 13. Mask for Proximity X-Ray LithographyMasatoshi Oda, Hideo YoshiharaAbstract - Hi-Res PDF (618 KB) - PDF w/links (614 KB)
Chapter 14. Mask SubstrateAbstract - Hi-Res PDF (228 KB) - PDF w/links (229 KB)
Chapter 15. Resists for Mask MakingBenjamen Rathsack, C. Grant Willson, David MedeirosAbstract - Hi-Res PDF (289 KB) - PDF w/links (317 KB)
Chapter 16. Resist Charging and HeatingMin Bai, Fabian Pease, Dachen ChuAbstract - Hi-Res PDF (1189 KB) - PDF w/links (1090 KB)
Chapter 17. Mask ProcessingSyed A. RizviAbstract - Hi-Res PDF (323 KB) - PDF w/links (324 KB)
Chapter 18. Mask MaterialsVladimir LibermanAbstract - Hi-Res PDF (631 KB) - PDF w/links (655 KB)
Chapter 19. PelliclesYung-Tsai Yen, Richard Heuser, Ching-Bore WangAbstract - Hi-Res PDF (577 KB) - PDF w/links (575 KB)
Chapter 20. Photomask Feature MetrologyJames PotzickAbstract - Hi-Res PDF (645 KB) - PDF w/links (647 KB)
Chapter 21. Optical Critical Dimension MetrologyRay J. HooblerAbstract - Hi-Res PDF (2439 KB) - PDF w/links (1753 KB)
Chapter 22. Photomask Critical Dimension Metrology in the Scanning Electron MicroscopeMichael T. PostekAbstract - Hi-Res PDF (1606 KB) - PDF w/links (1373 KB)
Chapter 23. Geometrical Characterization of Masks Using SPMSylvain Muckenhirn, A. MeyyappanAbstract - Hi-Res PDF (1746 KB) - PDF w/links (1489 KB)
Chapter 24. Metrology of Image PlacementSyed A. RizviAbstract - Hi-Res PDF (1075 KB) - PDF w/links (1067 KB)
Chapter 25. Optical Thin-Film Metrology for Photomask ApplicationsSyed A. RizviAbstract - Hi-Res PDF (1205 KB) - PDF w/links (1159 KB)
Chapter 26. Phase Measurement Tools for PSMHal KusunoseAbstract - Hi-Res PDF (582 KB) - PDF w/links (590 KB)
Chapter 27. Mask InspectionShirley Hemar, Anja RosenbuschAbstract - Hi-Res PDF (619 KB) - PDF w/links (593 KB)
Chapter 28. Tool for Inspecting MasksTakayoshi Matsuyama, Makoto YonezawaAbstract - Hi-Res PDF (487 KB) - PDF w/links (497 KB)
Chapter 29. Tools for Mask Image EvaluationAxel ZiboldAbstract - Hi-Res PDF (7094 KB) - PDF w/links (5845 KB)
Chapter 30. Mask RepairRandall LeeAbstract - Hi-Res PDF (1397 KB) - PDF w/links (1055 KB)
Chapter 31. Modeling and SimulationAndreas ErdmannAbstract - Hi-Res PDF (3815 KB) - PDF w/links (3367 KB)
