ABSTRACT
The low-energy ion beam is a promising candidate for fabrication
and characterization of nanostructures. The formation of ripples,
dots, and kinetic roughening on a number of thin films, e.g., Au, Pt,
Ag, Cu, Co, ZnO, and bulk surfaces of Si(100) and TiO2(110) under
keV energy ion bombardment are discussed. The influence of initial
surface perturbations and the importance of local ion impact angle
on the development of ion induced surface morphology are studied
and the beginning of nanostructure formation by ion bombardment
is explored. Regularly spaced electric and magnetic stripe formation
and the potential sputtering bymulticharged Ar ions of oxidized part
of prefabricated Si nanoripples are also revealed.
